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HAFNIUM OXIDE     HfO2 210.49

CAS

12055-23-1

Melting Point C

2758

Boiling Point C

5400

Density G/Cm3

9.68

Elec Resistivity Microhm-Cm

4.5 x 103@1100C

Crystal Structure

Cubic

REFERENCE
DATA
Grit Size Conversion from mesh size
Element Properties with descriptions
Contstants
Minerals by Hardness
Metal Content of Minerals
Distinct Color of Minerals
Scientific Conversion Factors4000+
MOHS Scale of Hardness
Temperature
Typical Chemistry
Materials by Density
The AEE Story
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Prices listed below are subject to change without notice due to market conditions.
Credit Cards or Company Purchase Orders accepted.
Minimum quantity orders may apply.    ORDER FORM

Catalog
No

Product Description

Purity
%

Particle
Size

Cost Per Pound

1-2

3-10

11-25

26-100

HF-601

hafnium oxide powder

99.9

-325 mesh

inquire

HF-610

hafnium oxide (500-700 ppm Zr)

99.995

**

inquire

HF-615

hafnium oxide Spectro Grade
(<50 ppm Zr)

99.998

**

inquire

HF-680

hafnium oxide sputtering targets

99.95

inquire

** HF-610 & HF-615 are available in the following sizes: 4.0-4.5 g, 6-8 x 10 mm pressure sintered pellets, 1-4 mm granules (black or white), -100 mesh powder, -200 mesh powder

USES:
Hafnium Oxide HfO2 is used in optical coatings, and as a high-k dielectric in DRAM capacitors. Hafnium based oxides are currently leading candidates to replace silicon oxide as a gate insulator in field effect transistors.

Appears to have planned use by both IBM and Intel to continue scaling down semiconductor features to continue Moore's Law, to continue to increase logic density in computer processors, increase clock speeds, or lower power consumption.


HAFNIUM OXIDE LINKS OF INTEREST:
NY Times Jan 2007                      Univ of Texas Gate Dielectric Study
Chemistry World Mar 2007         Thin Film Effects of Hf O2
More Hafnium Products              Nitration of Hf O2 by Sputtering


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